User manual CADENCE DESIGN SYSTEMS MASK COMPOSE RETICLE AND WAFER SYNTHESIS SUITE DATASHEET

[. . . ] CAD E N C E M A S K C O M P O S E R ET I C LE AND WAFE R SY N T H E S I S S U I T E DATASHEET CADENCE MASKCOMPOSE SUITE Within the Cadence MaskCompose suite, technology-and fab-specific requirements for the tapeout flow are captured by appropriate specialists at high levels of abstraction using a "definition module" GUI. Once captured, this flow definition information can be used over and over again by "implementation modules" to automatically generate appropriate circuit-specific output data. [. . . ] After entering a few simple pieces of information, the program is executed and generates the reticle design and associated wafer layout in conformance with the requirements set forth in the definition module. FEATURES FRAME gENERATION AND wAFER lAyOUT · Supportformulti-dieclustering · Supportformulti-layerreticles · Testdieinsertion BENEFITS · Providesahighlyefficientand environment-independent design tapeout system · Adefinitionvs. implementationparadigm allows users to take advantage of the benefits of automation (productivity, repeatability, fewer errors) while still satisfying the unique requirements of target process technologies and manufacturing environments · Simplifiessame-technologycell qualification through easy incorporation as optional test data into reticle designs · Automaticpaperworkgeneration boosts productivity and brings repeatability and accuracy to a process that is particularly error-prone when handled manually Figure 2: Automatically generated reticle frame diagram www. ca de nce . com C A D ENC E MA SKCO MPO SE RETI C LE A N D WA FER SYNTHESI S SUI TE 2 Thedefinition/implementationpartitioning of the MaskCompose suite lends itself to a cross-discipline usage model. Floorplan definitions may be created and controlled byphotomasking/lithographyorCAD specialists while actual design-specific implementations can be handled in the design group by the layout specialist. The definition module is used to specify technology parameters, i. e. layer polarities andmin/maxscribesizes. Includeditems may be defined as required vs. optional and assigned placement priority values. Scribe sizes may be specified in terms of a minimum size, maximum size, and an increment value by which the scribe size is increased until all required features are placed or maximum size is reached. Definitions may be constrained to allow for various types of equipment mix and match(forexample, 1x/5xmixesor stepper vendor combinations). Interactive wafer module The user also has the ability to manually manipulate and control the wafer layout or stepping patterns. The interactive wafer module provides the following user controls: · Addordropexposures(shots) · Add, delete, move, copy, andplace drop-in(s) · Modifyorintroducerowand column shifting · Markadditionalnon-yieldingdie archive documentation, can be generated. Because information is extracted directly from the MaskCompose database, content consistency is assured. As an option, documents can include automatically generated postscript and pdf diagrams of generated frame data. Information that is not captured or generated by MaskCompose can be extracted from files or prompted for at runtime by embedding appropriate commands in the various templates used. Based on the directions in a template, text entry fields, option menus, or other appropriate interface components will appear in the user's screen at runtime to prompt for and to collect the relevant information needed to generate the desired documents. AUTOMATIC PAPERwORK gENERATION · Templatebased · Customformats · Postscriptdiagrams · Accesstogeneratedand external information · Externalprogramaccess The MaskCompose paperwork generation module uses information generated by other MaskCompose modules and other provided information to rapidly create easily readable documents with customizedformats. Variouskindsof documents, including mask order forms, stepper tooling forms, and internal AUTOMATIC jOBDECK gENERATION · Rapidgenerationofmask vendor-specific jobdecks · Enablesmix-and-matchstepper environments The MaskCompose jobdeck generation product works cooperatively within the MaskCompose environment using existing, relevant information made available by other modules. Frame Multi-circuit and multi-layer mask generation The automated cluster builder may be used to quickly and easily define die clusters. Any number of circuits of various sizes may be quickly composed into a cluster using this capability. [. . . ] Cadence is a registered trademark and the Cadence logo is a trademark of Cadence Design Systems, Inc. All others are properties of their respective holders. [. . . ]